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Entry  Thu Mar 20 18:09:33 2014, tara, Notes, NoiseBudget, extracting phiL phiH Hong_coat_BR.zip
    Reply  Thu Mar 20 21:54:10 2014, Evan, Notes, NoiseBudget, extracting phiL phiH 
    Reply  Sat Mar 22 19:17:31 2014, tara, Notes, NoiseBudget, extracting phiL phiH hong_hist.pnghong_hist.fig
       Reply  Sun Mar 23 17:32:42 2014, tara, Notes, NoiseBudget, extracting phiL phiH phi_young_ta2o5.pngBR_Y_ta2o5.pngBR_Y_ta2o5.figphi_young_ta2o5.fig
          Reply  Mon Mar 24 20:56:35 2014, tara, Notes, NoiseBudget, extracting phiL phiH 
             Reply  Tue Mar 25 14:37:54 2014, tara, Notes, NoiseBudget, extracting phiL phiH phi_Y.JPG
                Reply  Wed Mar 26 21:53:50 2014, tara, Notes, NoiseBudget, extracting phiL phiH Penn2003_tab2.pngPSL1416_fig1.pngPSL1416_fig1.figphi_result.m.zip
                   Reply  Sat Mar 29 23:32:50 2014, tara, Notes, NoiseBudget, extracting phiL phiH PennLVCmarch2010.png
          Reply  Tue Mar 25 20:47:19 2014, Evan, Notes, NoiseBudget, extracting phiL phiH eratiosweep.pdf
Message ID: 1417     Entry time: Sat Mar 29 23:32:50 2014     In reply to: 1416
Author: tara 
Type: Notes 
Category: NoiseBudget 
Subject: extracting phiL phiH 

Heat treatment after coating changes loss angles of both SiO2 and Ta2O5. Our coating might really have higher loss (maybe because of the low temp annealing), regardless of the actual values of coatings Young's moduli.

I went through the paper by LMA2014 that measured loss in SiO2 and Ta2O5 using interferometry on a cantilever blade. They could also extract Young's moduli from thin film SiO2 and Ta2O5, their results are ~ 70GPa and 118 GPa respectively.

One interesting result is that losses are reduced with heat treatment after coating process.

SiO2 loss before heat treatment is ~ 6e-4,  and it goes down to ~ 0.6e-4 after the annealing (from broadband measurement).

From ring down measurement, SiO2 before heat treatment is ~ 4e-4. no result for the measurement after annealing.

For Ta2O5,from broadband measurement, the loss after heat treatment is ~ 4.7e-4, no result from the before heat treatment is reported.

From ring down, the loss is ~ 11.4e-4 before annealing, and down to ~ 4.9e-4 after annealing. 


Their annealing process is described in the paper.  I should find out more how losses of both materials change with different heat treatment i.e. time/ temperature/cooling, then see if any information about our mirrors can be retrieved from REO or not.

Right now, we have only the information about phiH and phiL as phiH = a*phiL + b. I still need another relation to get phiH and phiL individually. My plan is finding information about heat treatment vs loss, like the picture below (I still need to find for Ta2O5). Otherwise, it is hard to say anything about the loss from each material.


Most reports have different annealing temp, (I'm not considering time/ heating rate/ cooling rate right now, but they might be important) So I can compare loss vs annealing temp.

  • LMA2014 without annealing and annealing @ 500C, for SiO2 and Ta2O5, thin film.
  •  G1000356: Thin SiO2 at 300C, 600C 800C, 900C. This shows that loss decreases as annealing temp increases, see the picture below. Notice that loss at 600C is comparable to what report in LMA (0.6e-4, @500C).


It is hard to extract the similar plot as above for Ta2O5 from Martin2010 paper. I'll try to ask Ian Martin if he can give me the raw data. 

From the loss vs annealing temp I found out below, it seems that the annealing temp for our mirrors will be less than 300C. Since at 300C, silica loss is ~ 1.5e-4, tantala loss is ~ 4e-4. These numbers give the estimated BR noise below our measurement. 



  •  find out if Young's moduli change with annealing process. 
  • Coating layer thickness increases after heat treatment effect. This directly increases thermal noise. Find out how much it could be.

ref: silica loss with vs different heat treatment temperature. https://dcc.ligo.org/DocDB/0010/G1000356/001/PennCoatingMarch10.pdf

Martin2010: Class. Quantum Grav. 27 (2010) 225020 (13pp): Tantala loss with different heat treatment temperature

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